Consider a MOS capacitor made with p-type silicon. It has an oxide thickness of \(100 \, {nm}\), a fixed positive oxide charge of \(10^{-8} \, {C/cm}^2\) at the oxide-silicon interface, and a metal work function of \(4.6 \, {eV}\). Assume that the relative permittivity of the oxide is \(4\), and the absolute permittivity of free space is \(8.85 \times 10^{-14} \, {F/cm}\). If the flatband voltage is \(0 \, {V}\), the work function of the p-type silicon (in eV, rounded off to two decimal places) is \(\_\_\_\_\).