We are given the following information:
- The concentration of silicon atoms in pure Si is \( 5 \times 10^{28} \) m\(^{-3}\).
- The doping concentration of antimony is 1 ppm, which means \( 1 \, \text{ppm} = \frac{1}{10^6} \).
- The concentration of antimony in the doped Si is therefore:
\[
\text{Concentration of Sb} = \frac{1}{10^6} \times 5 \times 10^{28} = 5 \times 10^{22} \, \text{m}^{-3}
\]
- The concentration of holes in the doped crystal is \( 4.5 \times 10^9 \) m\(^{-3}\).
Now, the intrinsic carrier concentration \( n_i \) in a semiconductor is given by the product of electron and hole concentrations:
\[
n_i = \sqrt{n_e \times n_h}
\]
where:
- \( n_e \) is the concentration of electrons,
- \( n_h \) is the concentration of holes.
In the doped Si crystal, the number of electrons is approximately equal to the concentration of the dopant atoms (antimony), i.e., \( n_e \approx 5 \times 10^{22} \, \text{m}^{-3} \). The concentration of holes \( n_h \) is \( 4.5 \times 10^9 \, \text{m}^{-3} \).
Thus, the intrinsic concentration of charge carriers \( n_i \) is:
\[
n_i = \sqrt{5 \times 10^{22} \times 4.5 \times 10^9}
\]
\[
n_i = \sqrt{2.25 \times 10^{32}} = 1.5 \times 10^{16} \, \text{m}^{-3}
\]
Therefore, the concentration of intrinsic charge carriers is approximately \( 1.5 \times 10^{16} \, \text{m}^{-3} \).