Question:
The Extreme Ultraviolet (EUV) lithography employs .......... wavelength.
The Extreme Ultraviolet (EUV) lithography employs .......... wavelength.
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EUV lithography enables the production of smaller microprocessors with higher performance by using shorter wavelengths (13.5 nm) compared to traditional photolithography.
Updated On: Sep 19, 2025
- 13.5 nm
- 53.5 nm
- 100 nm
- 50 nm
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The Correct Option is A
Solution and Explanation
Step 1: Understanding EUV lithography.
EUV lithography is a next-generation technology used in semiconductor manufacturing, and it operates at a wavelength of 13.5 nm, enabling the creation of smaller features on chips.
Step 2: Conclusion.
Thus, the correct wavelength used in EUV lithography is 13.5 nm, so the answer is option (1).
EUV lithography is a next-generation technology used in semiconductor manufacturing, and it operates at a wavelength of 13.5 nm, enabling the creation of smaller features on chips.
Step 2: Conclusion.
Thus, the correct wavelength used in EUV lithography is 13.5 nm, so the answer is option (1).
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