Given:
- Pure silicon at 300 K has intrinsic electron and hole concentrations:
\[
n_i = p_i = 1.5 \times 10^{16} \, \text{m}^{-3}
\]
- Hole concentration increases to:
\[
p = 3 \times 10^{22} \, \text{m}^{-3}
\]
We need to find the new electron concentration \( n \) in the silicon.
Step 1: Use the mass action law for semiconductors:
\[
np = n_i^2
\]
where \( n \) is electron concentration, \( p \) is hole concentration, and \( n_i \) is intrinsic carrier concentration.
Step 2: Rearrange to solve for \( n \):
\[
n = \frac{n_i^2}{p}
\]
Step 3: Substitute the values:
\[
n = \frac{(1.5 \times 10^{16})^2}{3 \times 10^{22}} = \frac{2.25 \times 10^{32}}{3 \times 10^{22}} = 0.75 \times 10^{10} = 7.5 \times 10^{9} \, \text{m}^{-3}
\]
Therefore, the electron concentration in the silicon after the increase in hole concentration is:
\[
\boxed{7.5 \times 10^{9} \, \text{m}^{-3}}
\]