Extrinsic semiconductors are made by doping pure or intrinsic semiconductors with suitable impurity. There are two types of dopants used in doping, Si or Ge, and using them p-type and n-type semiconductors can be obtained. A p-n junction is the basic building block of many semiconductor devices. Two important processes occur during the formation of a p-n junction: diffusion and drift. When such a junction is formed, a ’depletion layer’ is created consisting of immobile ion-cores. This is responsible for a junction potential barrier. The width of a depletion layer and the height of potential barrier changes when a junction is forward-biased or reverse-biased. A semiconductor diode is basically a p-n junction with metallic contacts provided at the ends for application of an external voltage. Using diodes, alternating voltages can be rectified.
A circular coil of diameter 15 mm having 300 turns is placed in a magnetic field of 30 mT such that the plane of the coil is perpendicular to the direction of the magnetic field. The magnetic field is reduced uniformly to zero in 20 ms and again increased uniformly to 30 mT in 40 ms. If the EMFs induced in the two time intervals are \( e_1 \) and \( e_2 \) respectively, then the value of \( e_1 / e_2 \) is: