Question

In IC technology, dry oxidation (using dry oxygen) as compared to wet oxidation (using steam or water vapor) produces

• A. Superior quality oxide with a higher growth rate
• B. Inferior quality oxide with a higher growth rate
• C. Inferior quality oxide with a lower growth rate
• D. Superior quality oxide with a lower growth rate

Hint:

For better quality oxide layers in IC fabrication, dry oxidation is preferred, though it grows at a slower rate compared to wet oxidation.

Answer 1

The Correct Option is D

Dry oxidation using dry oxygen produces a higher quality oxide layer compared to wet oxidation, but it has a slower growth rate. Wet oxidation using steam or water vapor produces oxide layers more quickly but with lower quality. Thus, the correct answer is option (4).