Comparing nMOSFETs and pMOSFETs of similar dimensions:
Electron mobility (\(\mu_n\)) is significantly higher than hole mobility (\(\mu_p\)) in silicon (\(\mu_n \approx 2-3 \times \mu_p\)).
ON resistance (\(R_{ON}\)): Since \(R_{ON}\) is inversely related to mobility, nMOSFETs have lower ON resistance than pMOSFETs of the same size. So, statement (a) "ON resistance is high" for nMOSFET compared to pMOSFET is WRONG. Incorrect
Size: For the same current driving capability (i.e., same \(R_{ON}\)), a pMOSFET needs to be larger (wider channel) than an nMOSFET. Thus, an nMOSFET can be smaller for a given performance. Statement (b) is correct for nMOSFETs. Correct
Junction capacitance: Smaller size for nMOSFETs (for same current) can lead to smaller parasitic capacitances. Statement (c) can be correct. Correct
Speed: Higher mobility in nMOSFETs leads to faster switching speeds and higher transconductance. Statement (d) is correct. Correct
\[ \boxed{\text{ON resistance is high}} \]
Extrinsic semiconductors are made by doping pure or intrinsic semiconductors with suitable impurity. There are two types of dopants used in doping, Si or Ge, and using them p-type and n-type semiconductors can be obtained. A p-n junction is the basic building block of many semiconductor devices. Two important processes occur during the formation of a p-n junction: diffusion and drift. When such a junction is formed, a ’depletion layer’ is created consisting of immobile ion-cores. This is responsible for a junction potential barrier. The width of a depletion layer and the height of potential barrier changes when a junction is forward-biased or reverse-biased. A semiconductor diode is basically a p-n junction with metallic contacts provided at the ends for application of an external voltage. Using diodes, alternating voltages can be rectified.