Nanotechnology fabrication techniques are broadly categorized into two approaches:
top-down and
bottom-up.
The
top-down approach involves starting with bulk materials and shaping them into nanoscale structures by removing material using physical or chemical processes. Common techniques include:
- Lithography: Patterning materials using light or electrons.
- Etching: Removing layers using chemical or plasma processes.
- Milling: Mechanical reduction of particle sizes or surface shaping.
Self-assembly, however, belongs to the
bottom-up approach, where atoms or molecules organize themselves into structured arrangements due to physical or chemical interactions. It is driven by principles of thermodynamics and molecular affinity, not by external machining or fabrication steps. Therefore,
self-assembly is not typically associated with the top-down approach.