The barrier potential of a p-n junction diode is primarily determined by the difference in work functions between the p-type and n-type materials and the intrinsic properties of the materials themselves. It does not depend on diode design. On the other hand, temperature, doping density, and forward bias voltage can influence the barrier potential.
So, the correct option is (A): diode design
Assertion (A): We cannot form a p-n junction diode by taking a slab of a p-type semiconductor and physically joining it to another slab of an n-type semiconductor.
Reason (R): In a p-type semiconductor, \( n_e \gg n_h \) while in an n-type semiconductor \( n_h \gg n_e \).
The graph shows the variation of current with voltage for a p-n junction diode. Estimate the dynamic resistance of the diode at \( V = -0.6 \) V.

A P-N junction is an interface or a boundary between two semiconductor material types, namely the p-type and the n-type, inside a semiconductor.
in p-n junction diode two operating regions are there:
There are three biasing conditions for p-n junction diode are as follows: